Descrição:
Bellingham, WA, U.S.A.: SPIE PRESS-The International Society for Optical Engineering, 1984. Ex-Library. Very Good. Paperback. 1st.. W/full markings and pocket. Wear, Soil. Size: 4to.
![Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies](https://d3525k1ryd2155.cloudfront.net/f/065/525/9780892525065.OL.0.l.jpg)
Foto de Stock: A capa pode ser diferente.
Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III: March 15-16, 1984, Santa Clara, California (Proceedings of SPIE--the International Society for Optical Engineering) Brochura - 1984
por Alfred (Editor) Wagner
Detalhes
- Título Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III: March 15-16, 1984, Santa Clara, California (Proceedings of SPIE--the International Society for Optical Engineering)
- Autor Alfred (Editor) Wagner
- Encadernação Brochura
- Edição 1st
- Editorial SPIE--the International Society for Optical Engineering, Bellingham, WA, U.S.A.
- Data de publicação 1984
- ISBN 9780892525065
Mais exemplares à venda
![Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies III, Conference...](https://d3525k1ryd2155.cloudfront.net/f/065/525/9780892525065.OL.0.m.jpg)
Foto de Stock: A capa pode ser diferente.
Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies III, Conference Proceedings, Volume 471, 15-16 March 1984, Santa Clara, California, SPIE.
por Wagner, Alfred (Editor)
- Usado
- Muito Bom
- Brochura
- first
- Condição
- Usado - Muito Bom
- Edição
- 1st.
- Encadernação
- Paperback
- ISBN 10 / ISBN 13
- 9780892525065 / 0892525061
- Quantidade Disponível
- 1
- Livreiro
-
NEWARK, Ohio, United States
- Preço do item
-
€ 17,06€ 5,21 frete para USA
Mostrar detalhes
Preço do item
€ 17,06
€ 5,21
frete para USA